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Sputtering Deposition System

Clark D21

Three 2″ sources for magnetron argon sputtering of metals, ceramics, and reactively sputtered materials (using oxygen or nitrogen) via DC or RF power. Cryo-pumped system for ~10-7 Torr base pressures. Stages available for substrate rotation, substrate heating >700° C, or simultaneous rotation and heating up to ~400°C.

For rates information, please see the rates page.
Primary Contact

Steve Kriske
607/255-2367
sjk27@cornell.edu
Clark Hall, Room D-21
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