HomeFacilitiesInstrumentsNeocera Ex200 Pulsed Laser Deposition System

Neocera Ex200 Pulsed Laser Deposition System

20130111112345_IMG_2150.jpg-thumbBard B47B

248nm Fluorine excimer laser with maximum energy output of 200mJ. Laser fluence values at target of approximately 1 J/cm². Laser is capable of pulsing at a max frequency of 20Hz. System is equipped with a turbo molecular pump and can achieve vacuum of approximately 10-7 torr. Deposition in Oxygen or Argon atmosphere is also possible.

Configurable target carousel can hold six 1” targets or three 2” targets. Multiple substrate carriers can hold 2”, 3”, or 4” Si wafers; a solid plate for attaching with silver paste and a solid plate with clips. System is equipped with CCS for making compositional spreads. Resistive substrate heater with max temperature of 1050°C. Heat loss between substrate and heater is ~18%

For rates information, please see the rates page.
Primary Contact

Philip Carubia
607/255-6757
pmc228@cornell.edu
Bard Hall, Room B-57
Powered By: AcademicsWeb