HomeFacilitiesInstrumentsKJL Magnetron Sputtering Tool

KJL Magnetron Sputtering Tool

20130322140523_kjl.jpg-thumbClark D21

Dedicated for sputter deposition of materials for magnetic nano-devices, this partially-automated system utilizes six 3″ magnetron sources for sputter deposition onto substrates as large as 6″ diameter. Deposition targets may include permalloy, B, Cr, Co-Fe, Cu, Ir, Mg, Mn, Nb, Al, Hf, Ru, Si, Ti, Ta, V and others. Contact manager for information.

For rates information, please see the rates page.

Primary Contact

Steve Kriske
607/255-2367
sjk27@cornell.edu
Clark Hall, Room D-21
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